IMEC2 High NA EUV 이 글은 imec에 올라온 The case for High NA EUV: unlocking the next era of chip manufacturing를 번역한 글입니다.ReferencesHigh-NA EUV lithography: the next major step forward, imec Reading Room, October 2021Imec and ASML open joint High NA EUV Lithography Lab offering an early development platform to the leading-edge semiconductor ecosystem, imec press release, June 2024Imec demonstrates readiness of the High-N.. 2026. 6. 12. 차세대 3D NAND 플래시를 위한 z-피치 스케일링 해당 글은 imec에 올라온 Unlocking z-pitch scaling for next-generation 3D NAND flash 을 번역한 것입니다.ReferencesSK hynix Starts Mass Production of World's First 321-High NAND spectrum.ieee.org/flash-memoryA confined storage nitride 3D-NAND cell with WL airgap for cell-to-cell interference reduction and improved program performances, D. Resnati, 2024 VLSIHole-side airgap integration as enabler for 3D NAND flash.. 2026. 6. 9. 이전 1 다음